Vacuum & Gas Abatement

Dry Vacuum Pumps

EBARA is a world leader in the design and manufacture of "dry" mechanical vacuum pumps. EBARA dry vacuum pumps provide a host of product enhancements including increased reliability, reduced clean room particulate load, low noise, low vibration, lower operating costs, and the lowest cost of ownership.

EBARA´s Dry Vacuum Pumps are designed for all applications such as physical vapor deposition (PVD), chemical vapor deposition (CVD), low pressure chemical vapor deposition (LPCVD), plasma enhanced chemical vapor deposition (PECVD) and metal etch, among them the harshest known in the industry.

EBARA's dry vacuum pumps are used for many applications in and outside the semiconductor industry where oil backstreaming is unacceptable. Custom designs and broad product lines make an EBARA dry vacuum pump the pump of choice. EBARA offers broad product lines with many models to choose from.

Product Overview

ESR series
EST series
ESA series
VOS series
EV-S series
PDV series

Turbomolecular Pumps

EBARA´s hybrid turbomolecular pumps provide a clean, reliable vacuum for the highest requirements in the semiconductor industry. The ET and ETA series Turbomolecular Pumps feature a five-axis magnetic bearing and tuning free half-rack controllers requiring no battery backup.

The ET version features a wide pressure range with maximum back pressure of 4 mbar.
The ETxxx-WS version is the corrosion resistant wide range type.

ETA vacuum pumps are designed for high throughput applications.

Overview

ET series
ETA series

Controllers

Gas Abatement Systems

Semiconductor, PV and LCD manufacturing processes produce hazardous solid by-products and waste gases. These processes produce a mixture of toxic, reactive, ignitable or corrosive gases. With the ever increasing stringency of environmental regulations hazardous gases need to be treated before being released onto the atmosphere or water systems.

EBARA offers a line of Point-of-Use Gas Abatement Systems capable of handling most processes in the microelectronics and solar industry. Our gas abatement product line includes wet, combustion, catalytic, dynamic oxidation and thermal technologies. All of EBARA’s gas abatement technologies are designed for low cost of ownership, high reliability and compliance to safety standards.

Product Overview

GDC 250, G series: G5
Airgard Cyclone
Pure Air Systems S.DOC, E.DOC-SC, E.DOC-TH

Ozonizers

Ozone (O3) is an allotrope of Oxygen (O2) and is the second most powerful oxidant next to fluorine. Ozone readily and spontaneously breaks down into oxygen. As a result ozone processing leaves no residues or harsh by-products and eliminates the transport, storage and waste removal of potentially dangerous chemicals. Ozone chemistry will play a vital role in "green" semiconductor manufacturing in the future. EBARA´s offering comprises the OZW series Ozonizer to generate ozonized water and the OZC series Ozonizer to generate ozone gas. The OZW is used for wafer cleaning, the OZC for example for TEOS processes to stimulate oxidation. The OZC and OZW patented electrode features extremely high volume flow and lowest metal ion contamination. OZW is equipped with a special Teflon hollow fibre membrane to ensure a high concentration of up to 30 ml/L. The ozonized water flow is up to 40 L/min. Both systems provide integrated flow control to limit flow instabilities to below +/- 10 %.


OZC OZW

Epix Filters

The new requirements for "more chemically clean environment" have been driven by the demand for semiconductor industries, foodstuffs and pharmaceutical plants. EBARA's novel EPIX Filters for removal of trace level chemical contaminants have been developed to reliably meet such requirement. The novel chemical filters are capable to remove acidic, basic and neutral salt contaminants in the air by means of chemical adsorption through ion exchange functions.

The EPIX filter exhibits its high performance at extremely low concentration ranges like ppb- and ppt-level of chemical contaminants in the air.

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