| Ozonizers |  | Ozone (O3) is an allotrope of Oxygen (O2) and is the second most powerful oxidant next to fluorine. Ozone readily and spontaneously breaks down into oxygen. As a result ozone processing leaves no residues or harsh by-products and eliminates the transport, storage and waste removal of potentially dangerous chemicals.
Ozone chemistry will play a vital role in "green" semiconductor manufacturing in the future.
EBARA´s offering comprises the OZW-series tool to generate ozonized water and the OZC-series tool to generate ozone gas. The OZW is used for wafer cleaning, the OZC for example for TEOS processes to stimulate oxidation. The OZC and OZW patented electrode features extremely high volume flow and lowest metal ion contamination. OZW is equipped with a special Teflon hollow fibre membrane to ensure a high concentration of up to 30 ml/L. The ozonized water flow is up to 40 L/min. Both systems provide integrated flow control to limit flow instabilities to below +/- 10 %. | | OZC OZW |
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