The EV-M with its multi-stage lobe design is best used for harsh duty applications. It has a higher H2 pumping speed compared to screw type vacuum pumps. The idle mode provides additional energy savings. The EV-M is powerful with low energy demands.
108 – 110.000 l/min
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Applications for EV-M
- Atomic Layer Deposition (ALD)
- Rapid Thermal Processing (RTP)
- Low Pressure Chemical Vapour Deposition (LPCVD)
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The chemical industry profits from our integrated solution for the disposal of fluorine-containing gases through highly efficient and reliable gas abatement systems and vacuum pumps.Read More