Description
The EST qualifies for harsh applications generating reactive chemical by-products. It manages large gas loads and enhanced powdery by-products. The compact design allows for increased operating temperatures and corrosion resistant material.
Core Benefits
Product Information
Application Range
light
harsh
Pumping speed
1.000 – 50.000 l/min
Models
EST10N
EST25N
EST100WN
EST200WN
EST300WN
EST500WN
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Applications for EST
- Atomic Layer Deposition (ALD)
- Rapid Thermal Processing (RTP)
- Low Pressure Chemical Vapour Deposition (LPCVD)
- HDP-CVD
- SACVD
- MOCVD
- PECVD
Success Story
Smart, clean and green.
The chemical industry profits from our integrated solution for the disposal of fluorine-containing gases through highly efficient and reliable gas abatement systems and vacuum pumps.
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