Description
The EV-L has no limits. Numerous applications use this model. Two types are available, with small footprints and pumping speeds of 10,000 and 18,000 l/min.
Core Benefits
Product Information
Application Range
light
harsh
Pumping speed
10.000 – 18.000 l/min
Models
EV-L100N
EV-L200N
Industries
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Applications for EV-L
- Physical Vapor Deposition (PVD)
- Atomic Layer Deposition (ALD)
- LED Manufacturing
- Metal Etch
- Poly Etch
- Low Pressure Chemical Vapour Deposition (LPCVD)
- Organic Light-emitting Diode (OLED)
- Photovoltaics (PV)
Success Story
Smart, clean and green.
The chemical industry profits from our integrated solution for the disposal of fluorine-containing gases through highly efficient and reliable gas abatement systems and vacuum pumps.
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